"集成电路知识产权保护的对象即为集成电路布图设计，在美国称为“掩膜作品”（Mask Work），日本成为“电路布图”(Circuit Layout),瑞典称为“布图设计”(Layout Design),欧盟许多国家称为拓扑图(Topography)。"
http://www.netlawcn.com/second/content.asp?no=492
(中国网络法律网)

书名: 知识产权许可 (上/下)
(下册)第八章，第六节
http://www.law-lib.com/shopping/shopview_p.asp?id=12255

"该版权法第912条宣布，原版权法中的绝大部分内容，将不适用于对半导体芯片掩膜作品的保护，其特殊的保护之处体现在..."
www.wiseman.com.cn/booksmarket/onlinenew/A0106-01.htm

" 《条例》保护的直接对象不是集成电路本身，而是布图设计，美国称之为“掩膜作品”，日本称之为“线路布局... "
www.iteconomy.cn/3redian/3-1wto/3-1-6.htm

"在1988年贸易法中，国会作出了一些规定，试图更为有效地保护美国的知识产权。根据这些规定，侵犯了美国专利、商标、版权、掩膜作品的产品进口是非法的。"
www.zypartners.com/info/ReadNews.asp?NewsID=93

"欲证明被诉企业因侵犯了申请人的知识产权而应提起“337”调查，申请人只需证明：1．有一项有效的可执行的美国专利、登记的版权、注册商标或注册的掩膜作品（集成电路布图设计）..."
www.legaldaily.com.cn/gb/misc/ 2003-04/16/content_24152.htm

Definition of "mask works":
The United States Code defines a mask work as "a series of related images, however fixed or encoded, having or representing the predetermined, three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product, and in which the relation of the images to one another is such that each image has the pattern of the surface of one form of the semiconductor chip product" (17 USC § 901 (a) (2)). Mask work exclusive rights were first granted in the US by the Semiconductor Chip Protection Act of 1984. In Canada these rights are protected under the Integrated Circuit Topography Act (1990, c. 37). Equivalent legislation exists in Australia and Hong Kong.
http://en.wikipedia.org/wiki/Mask_work